G02 Keynote

Monday, 29 May 2017: 08:30-10:00
Churchill B2 (Hilton New Orleans Riverside)
Chairs:
Kuniyuki Kakushima , Hemanth Jagannathan and P. J. Timans
08:30
Welcoming Remarks
08:40
1251
(Invited) VLSI-CMOS Device Technology Scaling Landscape Based on Fully-Depleted SOI and 3D-FinFET Technologies for the Internet of Everything Era
J. Hoentschel (Globalfoundries LLC), R. Carter (GLOBALFOUNDRIES), and B. Rice (Globalfoundries LLC)
09:40
Break
See more of: G02: Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 7
See more of: Electronic Materials and Processing
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