G01 - FEOL Cleaning

Mertens, Paul

Monday, 14 October 2019: 10:20-12:00

Room 209 (The Hilton Atlanta)

Chairs:

Paul W. Mertens and Yusuke Oniki

10:20

(Invited) Gate-All-Around Selective Etches: Opportunities and Challenges

Y. Oniki and F. Holsteyns (imec)

11:00

Study of Si Nanowire Surface Cleaning

S. Iwahata, Y. Yoshida, K. Komori (SCREEN Semiconductor Solutions Co., Ltd.), D. H. van Dorp, K. Wostyn, F. Sebaai, and F. Holsteyns (imec)

11:20

Study of Post Etch La₂O₃ Compatible Clean By the Control of pH during the Rinse

Y. Ogawa (Kurita Water Industries Ltd.,), I. Hideaki (Kurita Water Industries Ltd), F. Takeo (Kurita Water Industries Ltd.,), Y. Oniki (imec vzw), Y. Akanishi (SCREEN Semiconductor Solutions Co., Ltd.), and F. Holsteyns (imec vzw)

11:40

Process Development of Radical Based Dry Clean for Advanced 3D NAND Fabrication

S. Wang, W. Zeng, C. Yan, H. Chung, P. Lembesis, J. Lo, S. Ma, R. Pakulski, and M. Yang (Mattson Technology)

See more of: G01: 16th International Symposium on Semiconductor Cleaning Science and Technology (SCST 16)
See more of: Electronic Materials and Processing

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