Underpotential, Overpotential and Electroless Deposition

Tuesday, October 13, 2015: 15:00-17:45
Russell A (Hyatt Regency)
Chairs:
Natasa Vasiljevic and Miomir B Vukmirovic
15:00
895
Cu Underpotential Deposition on Ru(0001)
S. Brankovic (University of Houston) and D. Wu (University of Houston)
15:20
896
(Invited) In Situ Stress and Nanogravimetric Measurements during Underpotential Deposition
G. R. Stafford, M. Fayette (National Institute of Standards and Technology), and U. Bertocci (National Institute of Standards and Technology)
16:00
897
Towards a Mechanistic Understanding of Platinum Thin Film Deposition on Au(111)
K. Schwarz (National Institute of Standards and Technology) and T. Moffat (National Institute of Standards and Technology)
16:20
898
(Invited) Electroless Deposition of Ruthenium Using Sodium Borohydride Reducing Agent: A Mechanistic Study Using Electrochemical Quartz Crystal Microbalance
A. Joi (Corporate Technology Development, Lam Research), A. Zieliene, E. Norkus (Center for Physical Sciences and Technology), L. Tamasauskaite-Tamasiunaite (Center for Physical Sciences and Technology), and Y. Dordi (Corporate Technology Development, Lam Research)
17:00
899
Effects of Cations on Electrochemical Behavior of Ni(II)/Ni in a Hydrophobic Ionic Liquid
Y. L. Zhu (Beijing Institute of Technology), Y. Katayama (Keio University), and T. Miura (Keio University)
17:20
900
In-Situ Stress Measurements during Cobalt Electrodeposition on (111)-Textured Au
M. Fayette (National Institute of Standards and Technology, Theiss Research), U. Bertocci (National Institute of Standards and Technology), and G. R. Stafford (National Institute of Standards and Technology)
17:40
Concluding Remarks
See more of: E02: Fundamentals of Electrochemical Growth and Surface Limited Deposition
See more of: Electrochemical/Electroless Deposition
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